Saturday, September 5, 2026
ASML targets High-NA EUV production availability by year-end
At Semicon Taiwan 2026, ASML High-NA product chief Greet Storms said the company expects 0.55-NA EXE systems to reach the availability customers need for high-volume manufacturing by the end of 2026, targeting 90% fleet availability in the fourth quarter after 84% in July. Ten High-NA systems are running at four customers, with three more shipping or installing, and EXE tools had accumulated more than 1.35 million wafer exposures by mid-July. The qualified EXE:5200B reached 135 wafers per hour in acceptance testing, with a longer-term availability goal of 93%.
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