DUV Lithography (TWINSCAN NXT)

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ASML
ASML
DUV Lithography (TWINSCAN NXT)

Overview

Deep-ultraviolet immersion and dry scanners - the workhorses that pattern the large majority of layers on every chip made, from leading-edge logic to mature automotive nodes. The flagship NXT:2100i immersion system runs 295 wafers per hour; 279 DUV systems were recognized in 2025.

Shipping at scale; the bipartisan MATCH Act (S.4281), which would go further than existing export controls by banning both DUV immersion exports and the servicing of already-installed tools in China, remains stalled in Congress - the Senate NDAA it was expected to ride via a manager's amendment failed to advance on a July 14, 2026 procedural vote after Senate Democrats blocked it in an unrelated dispute over Iran-war funding, leaving the bill's floor path uncertain even after the House passed its own NDAA (with the MATCH Act's House companion H.R.8170) in July. Congress has been overtaken by direct executive action: an August 20, 2026 report said the US government is now preparing to pressure the Dutch government bilaterally to force a near-total ban on ASML's DUV sales and servicing to China, with an August 25, 2026 TrendForce report saying this could extend to tools already installed - the segment's biggest financial exposure regardless of which track (legislative or diplomatic) ultimately moves first

Key Specs

Throughput (NXT:2100i)

295 wafers/hour

2025 DUV revenue

€12.0B (279 systems, 47% immersion)